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发明名称
PHOTOMASK FOR FORMING LINE AND SPACE TYPE PATTERN
摘要
申请公布号
KR20050075634(A)
申请公布日期
2005.07.21
申请号
KR20040003572
申请日期
2004.01.17
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KIM, GYEONG HEE;LEE, JOON HEE
分类号
G03F1/38;G03F1/54;(IPC1-7):G03F1/08
主分类号
G03F1/38
代理机构
代理人
主权项
地址
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