| 摘要 |
PROBLEM TO BE SOLVED: To shorten maintenance time for a substrate-processing apparatus and increase a throughput of the substrate-processing apparatus by providing the substrate-processing apparatus, having a buffer chamber capable of easily discharging liquid inside the buffer chamber. SOLUTION: The substrate processing apparatus includes a reaction tube 203 for forming a space for accommodating and processing a substrate, a plurality of gas supply holes 248 for supplying processing gas into the reaction tube 203, and an isolation chamber 237, having a desired space provided integrally on the reaction tube 203. The substrate processing apparatus has an opening 10, provided at the corner of the isolation chamber 237 for discharging a cleaning solution used when cleaning the reaction tube 203. Consequently, even if a liquid is to infiltrate the isolation chamber 237, the liquid can be discharged rapidly from the opening 10. Accordingly, the cleaning time for the reaction tube 203 is shortened, and hence the maintenance time of the substrate processing apparatus can be shortened, and further, the throughput of the substrate processing apparatus can be improved. COPYRIGHT: (C)2005,JPO&NCIPI
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