发明名称 SUBSTRATE TREATMENT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide equipment wherein the equipment can be miniaturized, while the configuration equipped with a chamber in which treatment tools are arranged in the inside, and consumption of treatment liquid can be also reduced. SOLUTION: The chamber 10 of a tightly closed type, which has a substrate carry-in port 12 and a substrate taking out port 14, the processing tools 16, 18 arranged inside the chamber, and a roller transfer 20 which transfers a substrate W are installed. The length of the chamber is made smaller than the dimensions in the substrate transfer direction. An air supply pipe 28 for supplying air for purging into the chamber, and an exhaust pipe 30 for exhausting air for purging, from the inside of the chamber are installed, and internal atmosphere and external atmosphere of the chamber are isolated from each other. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005197487(A) 申请公布日期 2005.07.21
申请号 JP20040002670 申请日期 2004.01.08
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YAMAMOTO SATOSHI;SHIMA YASUMASA
分类号 B65G49/00;B08B3/00;B08B5/00;B65G49/06;B65G49/07;C23G3/00;H01L21/00;H01L21/02;H01L21/027;H01L21/302;H01L21/304;H01L21/306;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/00
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