发明名称 COATING APPARATUS AND METHOD FOR APPLYING COATING LIQUID
摘要 PROBLEM TO BE SOLVED: To provide a coating apparatus by which a functional thin film having uniform thickness and no orientation can be formed on the surface of a substrate. SOLUTION: This coating apparatus for jetting/applying a solution to the surface of the substrate W is provided with: a conveying table 10 to be reciprocated along an outward route and a homeward route; a table 3 arranged to be rotated on the conveying table 10 for holding the substrate W; a head 7 which is arranged on the upper side of the table 3 and has a plurality of nozzles arranged side by side along the direction crossing the moving direction of the conveying table 10; a driving motor 19 arranged on the conveying table 10 for rotary driving the table 3 and; a controller 62 for causing the driving motor 19 to rotate the table 3 to the direction of the outward route or the homeward route to change the course of the substrate W and then moving the conveying table 10 along the outward route or the homeward route so that the substrate W is made to pass under the head 7. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005193232(A) 申请公布日期 2005.07.21
申请号 JP20040359045 申请日期 2004.12.10
申请人 SHIBAURA MECHATRONICS CORP 发明人 MORIMITSU MAKI;KAJIWARA SHINJI;YAMAZAKI TAKAHIRO;SHIGEYAMA AKIHIRO
分类号 B41J2/01;B05C5/00;B05C13/02;B05D1/26;(IPC1-7):B05C5/00 主分类号 B41J2/01
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