发明名称 |
COATING APPARATUS AND METHOD FOR APPLYING COATING LIQUID |
摘要 |
PROBLEM TO BE SOLVED: To provide a coating apparatus by which a functional thin film having uniform thickness and no orientation can be formed on the surface of a substrate. SOLUTION: This coating apparatus for jetting/applying a solution to the surface of the substrate W is provided with: a conveying table 10 to be reciprocated along an outward route and a homeward route; a table 3 arranged to be rotated on the conveying table 10 for holding the substrate W; a head 7 which is arranged on the upper side of the table 3 and has a plurality of nozzles arranged side by side along the direction crossing the moving direction of the conveying table 10; a driving motor 19 arranged on the conveying table 10 for rotary driving the table 3 and; a controller 62 for causing the driving motor 19 to rotate the table 3 to the direction of the outward route or the homeward route to change the course of the substrate W and then moving the conveying table 10 along the outward route or the homeward route so that the substrate W is made to pass under the head 7. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005193232(A) |
申请公布日期 |
2005.07.21 |
申请号 |
JP20040359045 |
申请日期 |
2004.12.10 |
申请人 |
SHIBAURA MECHATRONICS CORP |
发明人 |
MORIMITSU MAKI;KAJIWARA SHINJI;YAMAZAKI TAKAHIRO;SHIGEYAMA AKIHIRO |
分类号 |
B41J2/01;B05C5/00;B05C13/02;B05D1/26;(IPC1-7):B05C5/00 |
主分类号 |
B41J2/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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