| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method and apparatus reducing the amount of by-products produced through a deposition system by providing a fluorine atmosphere in a thin film deposition process. <P>SOLUTION: A fluorine-containing gas is injected into a pump pressure-feeding system or a pump pressure-feeding and reducing system in a form where process by-products are kept to be volatile, and the deposition of undesirable by-products in a pump and a system feed line is prevented or is substantially eliminated, and further, optional depositions often formed on the surfaces at the insides of the pump and system feed line are revolatilized. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
