| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a reticle provided with a mark which can immediately discover a large change which is not the minute change of a projection power or shot rotation requiring a dedicated reticle or a dedicated measurer, but is directly connected to a failure of products, a method for manufacturing a semiconductor device using the same, and the semiconductor device. <P>SOLUTION: The selected figure shows the partially plan view of the layout state of a shot region 9 transferred to a resist film 15 covering a wafer 8. In the reticle, an L-shaped mark at the diagonal part of the shot region 9 is formed on a scribe line 14 as a cross type mark 16 in units of the diagonal part of the shot region 9. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
