发明名称 High-voltage silicon controlled rectifier structure with improved punch through resistance
摘要 When a high-voltage, such as from an ESD pulse, is placed across a silicon controlled rectifier, which includes an NPN transistor and a PNP transistor that is connected to the NPN transistor, the likelihood of punch through occurring between two regions of the rectifier is substantially reduced by forming the emitter of one transistor adjacent to the tails of the sinker down region of the other transistor.
申请公布号 US6919588(B1) 申请公布日期 2005.07.19
申请号 US20030650000 申请日期 2003.08.27
申请人 NATIONAL SEMICONDUCTOR CORPORATION 发明人 VASHCHENKO VLADISLAV;STRACHAN ANDY;HOPPER PETER J.;LINDORFER PHILIPP
分类号 H01L27/02;H01L29/74;(IPC1-7):H01L29/74 主分类号 H01L27/02
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