发明名称 |
Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique |
摘要 |
A method of generating a mask for use in printing a target pattern on a substrate. The method includes the steps of: (a) determining a target pattern representing a circuit design to be printed on a substrate; (b) generating a first pattern by scaling the target pattern by a factor of 0.5; and (c) generating a second pattern by performing a Boolean operation which combines the target pattern and the first pattern. The second pattern is then utilized to print the target pattern on the substrate.
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申请公布号 |
US6920628(B2) |
申请公布日期 |
2005.07.19 |
申请号 |
US20030395887 |
申请日期 |
2003.03.25 |
申请人 |
ASML MASKTOOLS B.V. |
发明人 |
CHEN JANG FUNG;VAN DEN BROEKE DOUGLAS |
分类号 |
G03F1/00;G03F7/20;G06F17/50;H01L21/027;(IPC1-7):G06F17/50 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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