发明名称 Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique
摘要 A method of generating a mask for use in printing a target pattern on a substrate. The method includes the steps of: (a) determining a target pattern representing a circuit design to be printed on a substrate; (b) generating a first pattern by scaling the target pattern by a factor of 0.5; and (c) generating a second pattern by performing a Boolean operation which combines the target pattern and the first pattern. The second pattern is then utilized to print the target pattern on the substrate.
申请公布号 US6920628(B2) 申请公布日期 2005.07.19
申请号 US20030395887 申请日期 2003.03.25
申请人 ASML MASKTOOLS B.V. 发明人 CHEN JANG FUNG;VAN DEN BROEKE DOUGLAS
分类号 G03F1/00;G03F7/20;G06F17/50;H01L21/027;(IPC1-7):G06F17/50 主分类号 G03F1/00
代理机构 代理人
主权项
地址