发明名称 Apparatus for analyzing a substrate employing a copper decoration
摘要 An apparatus for analyzing a substrate employing a copper decoration includes a bath having at least two receiving containers for receiving electrolytes, slots formed at insides of the receiving containers for receiving substrates to be analyzed in a direction that is normal to a bottom face of the bath, lower copper plates provided in the receiving containers, the lower copper plates making contact with entire rear faces of the substrates received in the receiving containers, upper copper plates provided in the receiving containers, each of the upper copper plates corresponding to a respective one of the lower copper plates, and separated from front faces of the substrates, and a power source connected to the upper copper plates and the lower copper plates for providing voltages to the same. A plurality of substrates may be simultaneously analyzed using one apparatus thereby greatly reducing an amount of time required for the analysis.
申请公布号 US6919214(B2) 申请公布日期 2005.07.19
申请号 US20030688954 申请日期 2003.10.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM GI-JUNG;CHO KYOO-CHUL;HEO TAE-YEOL;PARK SOOK-HYUN
分类号 G01N33/00;H01L21/66;(IPC1-7):H01L21/00 主分类号 G01N33/00
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