| 摘要 |
Asymmetric, disubstituted metallocene compounds have the general formula CpMCp' where M is a metal selected from the group consisting of Ru, Os and Fe; Cp is a first substituted cyclopentadienyl or indenyl moiety that includes at least one substituent group D<SUB>1</SUB>; Cp' is a second substituted cyclopentadienyl or indenyl moiety that includes at least one substituent group D<SUB>1</SUB>'. D<SUB>1 </SUB>is different from D<SUB>1</SUB>'. D<SUB>1 </SUB>is X; C<SUB>a1</SUB>H<SUB>b1</SUB>X<SUB>c1</SUB>; C<SUB>a2</SUB>H<SUB>b2</SUB>X<SUB>c2</SUB>(C-O)C<SUB>a1</SUB>H<SUB>b1</SUB>X<SUB>c1</SUB>; or C<SUB>a2</SUB>H<SUB>b2</SUB>X<SUB>c2</SUB>OC<SUB>a1</SUB>H<SUB>b1</SUB>X<SUB>c1</SUB>, where X is a halogen atom or nitro group; a1 is an integer between 2 and 8; b1 is an integer between 0 and 2(a1)+1-c1; c1 is an integer between 0 and 2(a1)+1-b1; b1+c1 is at least 1; a2 is an integer between 0 and 8; b2 is an integer between 0 and 2(a2)+1-c2; and c2 is an integer between 0 and 2(a2)+1-b2; and D1' is X; C<SUB>a1</SUB>H<SUB>b1</SUB>X<SUB>c1</SUB>; C<SUB>a2</SUB>H<SUB>b2</SUB>X<SUB>c2</SUB>(C-O)C<SUB>a1</SUB>H<SUB>b1</SUB>X<SUB>c1</SUB>; or C<SUB>a2</SUB>H<SUB>b2</SUB>X<SUB>c2</SUB>OC<SUB>a1</SUB>H<SUB>b1</SUB>X<SUB>c1</SUB>, where X is a halogen atom or nitro group; a1 is an integer between 1 and 8; b1 is an integer between 0 and 2(a2)+1-cl; c1 is an integer between 0 and 2(a1)+1-b1; b1+c1 is at least 1; a2 is an integer between 0 and 8; b2 is an integer between 0 and 2(a2)+1-c2; and c2 is an integer between 0 and 2(a2)+1-b2. The compounds can be employed as precursors in film deposition processes.
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