发明名称 Silicon-containing polymer, resist composition and patterning process
摘要 Silicon-containing polymers comprising recurring units of formula (1) are novel wherein R<SUP>1 </SUP>is a single bond or alkylene, R<SUP>2 </SUP>is hydrogen or alkyl, R<SUP>3</SUP>, R<SUP>4 </SUP>and R<SUP>5 </SUP>are alkyl, haloalkyl, aryl or silicon-containing group, R<SUP>6 </SUP>is hydrogen, methyl, cyano or -C(-O)OR<SUP>8 </SUP>wherein R<SUP>8 </SUP>is hydrogen, alkyl or acid labile group, R<SUP>7 </SUP>is alkyl, -NR<SUP>9</SUP>R<SUP>10 </SUP>or -OR<SUP>11 </SUP>wherein R<SUP>9</SUP>, R<SUP>10 </SUP>and R<SUP>11 </SUP>are hydrogen or alkyl, a and b are positive numbers satisfying 0<a+b<=1. Resist compositions comprising the polymers are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of less than 300 nm and improved resistance to oxygen plasma etching.
申请公布号 US6919161(B2) 申请公布日期 2005.07.19
申请号 US20030611261 申请日期 2003.07.02
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 HATAKEYAMA JUN;TAKEDA TAKANOBU;ISHIHARA TOSHINOBU
分类号 C08F230/08;G03F7/004;G03F7/039;G03F7/075;(IPC1-7):G03F7/004 主分类号 C08F230/08
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