| 发明名称 |
ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS |
| 摘要 |
The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193nm. The polymer of the present invention contains at least one unit selected from structures (1), (2), and (3).
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| 申请公布号 |
KR20050074624(A) |
申请公布日期 |
2005.07.18 |
| 申请号 |
KR20057008759 |
申请日期 |
2003.11.06 |
| 申请人 |
CLARIANT INTERNATIONAL LTD. |
发明人 |
WU HENGPENG;DING LEE SHUJI;XIANG ZHONG;OBERLANDER JOSEPH E;NEISSER MARK;GONZALEZ ELEAZAR;SHAN JIANHUI |
| 分类号 |
G03F7/038;G03F7/09;(IPC1-7):G03F7/09;G03F7/004 |
主分类号 |
G03F7/038 |
| 代理机构 |
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