发明名称 SUBSTRATE CLEANING DEVICE AND SUBSTRATE TREATING SYSTEM
摘要 PROBLEM TO BE SOLVED: To enhance a yield by properly protecting a substrate left in a cleaning device due to conveying troubles. SOLUTION: The device is provided with a plurality of cleaning modules 11-15 having cleaning means such as nozzles 20, 21 discharging a cleaning liquid to a substrate W, a detecting means detecting the stay of the substrate W in the modules 11-15 due to conveying troubles, and a controller controlling the operation of the cleaning means of the respective modules 11-15 and switching operation modes of the cleaning means at the time of occurrence of the conveying troubles by the use of input by an inputting means. The setup mode of the cleaning device allows a choice among three setups of a continuous mode for continuous operation, an intermittent mode for intermittent operation and a stop mode, and the controller controls the operation of the respective cleaning means 11-15 by the operation mode set for the respective cleaning means of the cleaning modules 11-15. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005185984(A) 申请公布日期 2005.07.14
申请号 JP20030431916 申请日期 2003.12.26
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 NAKADA HIROYUKI;SUZUKI SATOSHI
分类号 B08B5/02;B08B3/02;H01L21/304;(IPC1-7):B08B3/02 主分类号 B08B5/02
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