| 摘要 |
Positional information on the scanning direction and non-scanning direction of a reticle stage is measured, based on each of the measurement results of a reticle Y interferometer and a reticle X interferometer. Positional information of a wafer stage is also measured, based on measurement results of a wafer interferometer. Then, based on the measurement results of positional information on the non-scanning direction of the reticle stage, and on correlation information that denotes a relation between position measurement errors of reference points on the reflection surfaces stored in advance and the position of the reticle stage in the non-scanning direction corresponding to the position measurement errors, the positional information of the reticle stage whose measurement errors by the reticle Y interferometer have been corrected is obtained, and thus both stages are driven and controlled based on the corrected positional information and the positional information on the scanning direction-of the wafer sage.
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