发明名称 |
METHOD FOR PRODUCING A SEMICONDUCTOR COMPONENT WITH A PRASEODYMIUM OXIDE DIELECTRIC |
摘要 |
The invention relates to a semiconductor component and a method for the production thereof. The inventive component comprises a silicium-containing layer, a praseodymium-containing layer and a mixed silicium and praseodymium oxide layer which contains oxygen and disposed between said silicium- and praseodymium-containing layers. The mixed oxide layer makes it possible to improve the component capacitance and to obtain a high charge carrier mobility in such a way than it is not necessary to use an intermediate silicium oxide layer. |
申请公布号 |
WO2005024930(A3) |
申请公布日期 |
2005.07.14 |
申请号 |
WO2004EP09559 |
申请日期 |
2004.08.20 |
申请人 |
IHP GMBH - INNOVATIONS FOR HIGH PERFORMANCE MICROELECTRONICS / INSTITUT FUER INNOVATIVE MIKROELEKTRONIK;MUESSIG, HANS-JOACHIM |
发明人 |
MUESSIG, HANS-JOACHIM |
分类号 |
H01L21/28;H01L21/316;H01L29/51 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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