发明名称 METHOD FOR PRODUCING A SEMICONDUCTOR COMPONENT WITH A PRASEODYMIUM OXIDE DIELECTRIC
摘要 The invention relates to a semiconductor component and a method for the production thereof. The inventive component comprises a silicium-containing layer, a praseodymium-containing layer and a mixed silicium and praseodymium oxide layer which contains oxygen and disposed between said silicium- and praseodymium-containing layers. The mixed oxide layer makes it possible to improve the component capacitance and to obtain a high charge carrier mobility in such a way than it is not necessary to use an intermediate silicium oxide layer.
申请公布号 WO2005024930(A3) 申请公布日期 2005.07.14
申请号 WO2004EP09559 申请日期 2004.08.20
申请人 IHP GMBH - INNOVATIONS FOR HIGH PERFORMANCE MICROELECTRONICS / INSTITUT FUER INNOVATIVE MIKROELEKTRONIK;MUESSIG, HANS-JOACHIM 发明人 MUESSIG, HANS-JOACHIM
分类号 H01L21/28;H01L21/316;H01L29/51 主分类号 H01L21/28
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