发明名称 |
Manipulator assembly in ion implanter |
摘要 |
A manipulator assembly in an ion implanter comprises a ground electrode, a first suppression electrode located on a first side of the ground electrode facing an ion source device for producing ion beams, a second suppression electrode which is located on a second side of the ground electrode opposite to the first side, connection legs which electrically connect and mechanically support the first and second suppression electrodes; and an insulator which is located between the ground electrode and the second suppression electrode to insulate the ground electrode from the first and second suppression electrodes.
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申请公布号 |
US2005151089(A1) |
申请公布日期 |
2005.07.14 |
申请号 |
US20040025595 |
申请日期 |
2004.12.28 |
申请人 |
BONG SUNG-JONG;EOM HONG-KUK;YOU DOO-SANG |
发明人 |
BONG SUNG-JONG;EOM HONG-KUK;YOU DOO-SANG |
分类号 |
H01J3/26;H01J37/08;H01L21/265;(IPC1-7):H01J37/08 |
主分类号 |
H01J3/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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