发明名称 METHOD FOR TREATING SULFUR HEXAFLUORIDE GAS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for treating sulfur hexafluoride gas to be used as an insulating medium of a gas insulation switchgear, or the like and a dry etching agent or a fluorinating agent of LSI (large scale integrated circuits). <P>SOLUTION: This method for treating exhaust gas, namely, bringing exhaust gas containing sulfur hexafluoride gas into contact with a treating agent to remove the sulfur hexafluoride gas from the exhaust gas comprises a preceding step to use catalyst-containing silicon oxide as the treating agent and produce silicon fluoride gas and sulfur oxide gas and a succeeding step to treat the gases produced at the preceding step by an alkali chemical-packed cylinder or a wet scrubber. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005185897(A) 申请公布日期 2005.07.14
申请号 JP20030427881 申请日期 2003.12.24
申请人 CENTRAL GLASS CO LTD 发明人 ICHIMARU HIROSHI
分类号 B01D53/86;B01J21/08;B01J23/06;B01J23/08;B01J23/42;B01J23/44 主分类号 B01D53/86
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