发明名称 HIGH INTEGRITY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING BULK QUANTITIES OF SAME
摘要 A method of making metal plates as well as sputtering targets is described. In addition, products made by the process of the present invention are further described. The present invention preferably provides a product with reduced or minimized marbleizing on the surface of the metal product which has a multitude of benefits.
申请公布号 WO2005064037(A2) 申请公布日期 2005.07.14
申请号 WO2004US42734 申请日期 2004.12.20
申请人 CABOT CORPORATION;MICHALUK, CHRISTOPHER, A.;HUBER, LOUIS, E.;ALEXANDER, P., TODD 发明人 MICHALUK, CHRISTOPHER, A.;HUBER, LOUIS, E.;ALEXANDER, P., TODD
分类号 B21B23/00;C22F1/00;C22F1/18;C23C14/34 主分类号 B21B23/00
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