FILM-FORMING APPARATUS AND FILM-FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a film-forming apparatus which reduces a film-forming cost by improving an utilization efficiency of a precursor used for film formation, and to provide a film-forming method therefor.

SOLUTION: The film-forming apparatus is directed at forming the film by supplying a treatment medium containing a medium in a supercritical state and the precursor to a substrate to be treated, and comprises: a treatment vessel; a pedestal that holds the substrate to be treated which is placed in the treatment vessel, and has a heating means; a medium-supplying portion which is connected to the treatment vessel through a medium-supplying path and supplies the treatment medium to the treatment vessel; and a medium-refluxing path for refluxing the treatment medium supplied to the treatment vessel to the medium-supplying portion, wherein the medium-supplying portion has a temperature-controlling means for controlling a temperature of the treatment medium.

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