PHOTOMASK AND METHOD FOR MAINTAINING OPTICAL PROPERTIES OF THE SAME
摘要
A photomask and method for maintaining optical properties of the same are disclosed. The method includes providing a substrate including a first surface having an absorber layer formed thereon and a second surface located opposite the first surface. A pattern is formed in the absorber layer to create a photomask for use in a semiconductor manufacturing process. A transmissive protective layer is also formed on at least one of the patterned layer and the second surface of the substrate. The protective layer reduces haze growth when the photomask is used in the semiconductor manufacturing process.
申请公布号
WO2005022258(A3)
申请公布日期
2005.07.14
申请号
WO2004US27435
申请日期
2004.08.24
申请人
DUPONT PHOTOMASKS, INC.;DIEU, LAURENT;GORDON, JOSEPH STEPHEN;JOHNSTONE, ERIC VINCENT;CHOVINO, CHRISTIAN
发明人
DIEU, LAURENT;GORDON, JOSEPH STEPHEN;JOHNSTONE, ERIC VINCENT;CHOVINO, CHRISTIAN