| 摘要 |
A polishing pad which ensures that a work can be easily removed from the polishing pad surface after polishing, the amount of a polishing liquid used for polishing can be reduced, and the production cost of the polishing pad can be lowered. A first polishing pad ( 1 ) for polishing a work is provided with a plurality of slots ( 11 ) piercing the first polishing pad ( 1 ) in a sa direction, the length in the longitudinal direction of the slots ( 11 ) being preferably not less than 20 mm, the pitch in the width direction of the slots ( 11 ) being preferably less than 100 mm, and small holes (not shown) may be provided in addition to the slots ( 11 ). |
