GRAY SCALE MASK, METHOD FOR MANUFACTURING OPTICAL DEVICE, METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING GRAY SCALE MASK

摘要

PROBLEM TO BE SOLVED: To provide a high accuracy gray scale mask having transmittance approximate to a designed value.

SOLUTION: The gray scale mask is produced by forming a fine pattern on a reticle, reducing and transferring the pattern onto a wafer whose surface is coated with a resist by exposure by using an exposure transfer apparatus, developing the resist and etching the wafer by using the remaining resist as a mask. The distance S between the fine patterns is controlled to be≥0.3λ/NA, wherein NA is the numerical aperture of the exposure apparatus andλis the wavelength of the light used for exposure.

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