发明名称 Thin film formation method, thin film formation equipment, method of manufacturing organic electroluminescence device, organic electroluminescence device, and electronic apparatus
摘要 A thin film formation method is provided which can carry out various kinds of patterning deposition correctly and with high precision, and a thin film formation equipment. The thin film formation method arranges a mask between a substrate and a material source and forms the material of the material source as a thin film on the substrate. The method further includes: a substrate contacting process to contact the mask and the substrate; a gap measurement process to measure a gap between the mask and the substrate; and a thin film formation process to form the thin film according to the measurement result in the gap measurement process.
申请公布号 US2005153472(A1) 申请公布日期 2005.07.14
申请号 US20040022385 申请日期 2004.12.23
申请人 YOTSUYA SHINICHI 发明人 YOTSUYA SHINICHI
分类号 H05B33/10;C23C4/00;C23C4/12;C23C14/04;C23C14/12;C23C14/24;H01L51/50;(IPC1-7):H01L21/00;H01L21/66;H01L21/84;H01L51/40 主分类号 H05B33/10
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