发明名称 |
Thin film formation method, thin film formation equipment, method of manufacturing organic electroluminescence device, organic electroluminescence device, and electronic apparatus |
摘要 |
A thin film formation method is provided which can carry out various kinds of patterning deposition correctly and with high precision, and a thin film formation equipment. The thin film formation method arranges a mask between a substrate and a material source and forms the material of the material source as a thin film on the substrate. The method further includes: a substrate contacting process to contact the mask and the substrate; a gap measurement process to measure a gap between the mask and the substrate; and a thin film formation process to form the thin film according to the measurement result in the gap measurement process.
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申请公布号 |
US2005153472(A1) |
申请公布日期 |
2005.07.14 |
申请号 |
US20040022385 |
申请日期 |
2004.12.23 |
申请人 |
YOTSUYA SHINICHI |
发明人 |
YOTSUYA SHINICHI |
分类号 |
H05B33/10;C23C4/00;C23C4/12;C23C14/04;C23C14/12;C23C14/24;H01L51/50;(IPC1-7):H01L21/00;H01L21/66;H01L21/84;H01L51/40 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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