发明名称 TREATMENT METHOD AND TREATMENT DEVICE FOR HALOGEN BASED GAS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method capable of sufficiently adsorbing halogen based gas even when an adsorbent is dried, and a device. <P>SOLUTION: The treatment method for the halogen based gas has a step for contacting the halogen based gas with NaHCO<SB>3</SB>; and a step for adsorbing the halogen based gas to a Ca(OH)<SB>2</SB>based adsorbent. In the treatment device for the halogen based gas, a column filled with a mixture of NaHCO<SB>3</SB>and the Ca(OH)<SB>2</SB>based adsorbent and a column filled with an NaHCO<SB>3</SB>layer in the upstream side and a Ca(OH)<SB>2</SB>based adsorbent layer in the downstream side are provided. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005185876(A) 申请公布日期 2005.07.14
申请号 JP20030426877 申请日期 2003.12.24
申请人 L'AIR LIQUIDE SA POUR L'ETUDE & L'EXPLOITATION DES PROCEDE S GEORGES CLAUDE 发明人 SATO MISUZU
分类号 B01D53/02;B01D53/04;B01J20/04;(IPC1-7):B01D53/02 主分类号 B01D53/02
代理机构 代理人
主权项
地址