发明名称 PHOTOPOLYMERIZABLE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a high sensitivity photopolymerizable composition which efficiently generates active free radicals by irradiation with energy rays, particularly light to enable the polymerization of a radical-curable substance in a short time. <P>SOLUTION: The photopolymerizable composition comprises a compound represented by formula (1) (wherein R<SB>1</SB>and R<SB>2</SB>are each a monovalent organic residue, and R<SB>1</SB>and R<SB>2</SB>may be bonded to each other to form a cyclic structure; and R<SB>3</SB>is hydrogen or a monovalent organic residue), a compound represented by formula (2) [wherein R<SB>3</SB>to R<SB>12</SB>are each hydrogen or a monovalent organic residue, provided that one to four of R<SB>5</SB>to R<SB>12</SB>contain an organic residue represented by formula (3) (wherein R<SB>13</SB>is hydrogen or a monovalent organic residue)], and a radically polymerizable compound. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005187678(A) 申请公布日期 2005.07.14
申请号 JP20030431742 申请日期 2003.12.26
申请人 TOYO INK MFG CO LTD 发明人 YANAI HIROYUKI;SUGANO MAKI;MATSUMOTO SEIYA;UESUGI TAKAHIKO
分类号 G03F7/031;C08F2/50 主分类号 G03F7/031
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