发明名称 |
Method for forming transparent thin film, transparent thin film formed by the method and transparent substrate with transparent thin film |
摘要 |
The present invention provides a method for forming a transparent thin film by a chemical vapor deposition method using a gaseous raw material. In the method, a film growth rate is at least 8 nm/s, and the transparent thin film contains at least one selected from carbon (C) and oxygen (O), nitrogen (N), hydrogen (H), and silicon (Si). According to this method, a transparent thin film that does not peel off a substrate easily due to the eased tension in the thin film and has high transmittance in the visible light region can be deposited on a glass ribbon in a float bath.
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申请公布号 |
US2005153072(A1) |
申请公布日期 |
2005.07.14 |
申请号 |
US20040503022 |
申请日期 |
2004.07.28 |
申请人 |
NIPPON SHEET GLASS COMPANY, LIMITED |
发明人 |
OTANI TSUYOSHI;HIRATA MASAHIRO |
分类号 |
C03C17/22;C03C17/245;C03C17/34;(IPC1-7):C23C16/00;B32B1/00 |
主分类号 |
C03C17/22 |
代理机构 |
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