PHOTOMASK DESIGN PROCESSING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a photomask design system for reducing the burden added on a facility carrying out OPC (optical proximity correction) process and reducing computing time.

SOLUTION: The photomask design processing system is connected to terminals of a plurality of clients for designing and carries out the process of designing a photomask based on the design request from the terminal. The system includes: a signal receiving unit to receive layout information which is the data showing the layout of a circuit pattern to be formed on a wafer and is sent through the terminals of the plurality of clients; an optical proximity correction processing unit to carry out the optical proximity correction on the layout of the circuit pattern based on the received layout information by the signal receiving unit and to design the photomask; and a control unit having the proximity correction processing unit in common to design based on the design request from the terminals of the plurality of clients.

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