发明名称 DICING FILM AND CUTTING METHOD OF SEMICONDUCTOR WAFER
摘要 PROBLEM TO BE SOLVED: To provide a dicing film, exhibiting superior performance for follow up of the protruding/recessed shape on the surface, flexibility, strength, and thermal resistance, without containing an adhesive, and to provide a cutting method of a semiconductor wafer which uses the dicing film. SOLUTION: The dicing film is composed of an elastomer composition containing at least one kind of polymer, selected from among a hydrogen additive of diene-based block polymer and a polar group denatured olefin based polymer. Hydrogen additive of conjugated diene block polymer or hydrogen additive of a block polymer, composed of conjugated diene and aromatic vinyl compound, is preferably employed as the hydrogen additive of diene-based block polymer. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005191297(A) 申请公布日期 2005.07.14
申请号 JP20030431076 申请日期 2003.12.25
申请人 JSR CORP 发明人 SUZUKI MASANORI;MIZOUCHI HIROYUKI;TOYODA NOBUYUKI;MORIKAWA AKIHIKO
分类号 C08L23/00;C08L53/00;H01L21/301;(IPC1-7):H01L21/301 主分类号 C08L23/00
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