| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection aligner and a projection exposure method for reliably and easily correcting aberration generated, when using a hard pellicle. SOLUTION: The projection aligner comprises a light source, an optical system, a reticle stage for retaining reticle, a first position adjustment mechanism for adjusting the position of the reticle, a wafer stage for placing a wafer, a plate for correcting aberration provided between the reticle and the wafer, and an angle adjustment mechanism for adjusting the tilt angle of the plate for correcting aberration. COPYRIGHT: (C)2005,JPO&NCIPI
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