发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method with which abnormal diffusion of Au over a semiconductor layer can be prevented. SOLUTION: A semiconductor device comprises an electrode 100 which contains a Pt layer and an Au layer, and in which either one of the layers forms a Schottky junction or an ohmic junction with a semiconductor layer. The method of manufacturing the semiconductor device includes a deposition step for depositing Ti, Pt, Au of electrode materials on the semiconductor layer using electron beam deposition process, a removal step for removing layers other than a layer wherein the Schottky junction or ohmic junction is formed with the semiconductor layer from a thin layer 20 containing the Pt layer and the Au layer formed in the electrode end in the deposition step, and an electrode formation step for forming an electrode using lift-off process. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005191372(A) 申请公布日期 2005.07.14
申请号 JP20030432577 申请日期 2003.12.26
申请人 SHARP CORP 发明人 SHIODA MASAHIRO
分类号 H01L21/28;H01L21/331;H01L21/338;H01L29/417;H01L29/423;H01L29/737;H01L29/812;(IPC1-7):H01L21/28 主分类号 H01L21/28
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