发明名称 DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD
摘要 <p>A defect inspection device able to positively reduce a noise light from a base layer and carry out a good defect inspection; and a defect inspection method. The device comprises a lighting device (13) for applying a lighting light to a substrate (11) under inspection having a resist layer formed at the upper layer thereof with cyclic patterns, and an imaging optical system (14) for forming the image of the substrate under inspection based on a light emitted from the substrate by the irradiation of the lighting light. The wavelength of the lighting light is set so that the intensity of a light from the surface of the resist layer, out of lights emitted from the substrate, is larger than that of a light gone through the surface of a cyclic pattern layer formed below the resist layer.</p>
申请公布号 WO2005064322(A1) 申请公布日期 2005.07.14
申请号 WO2004JP19370 申请日期 2004.12.24
申请人 NIKON CORPORATION;FUKAZAWA, KAZUHIKO;OOMORI, TAKEO 发明人 FUKAZAWA, KAZUHIKO;OOMORI, TAKEO
分类号 G01N21/956;(IPC1-7):G01N21/956;H01L21/66 主分类号 G01N21/956
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