发明名称 |
DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD |
摘要 |
<p>A defect inspection device able to positively reduce a noise light from a base layer and carry out a good defect inspection; and a defect inspection method. The device comprises a lighting device (13) for applying a lighting light to a substrate (11) under inspection having a resist layer formed at the upper layer thereof with cyclic patterns, and an imaging optical system (14) for forming the image of the substrate under inspection based on a light emitted from the substrate by the irradiation of the lighting light. The wavelength of the lighting light is set so that the intensity of a light from the surface of the resist layer, out of lights emitted from the substrate, is larger than that of a light gone through the surface of a cyclic pattern layer formed below the resist layer.</p> |
申请公布号 |
WO2005064322(A1) |
申请公布日期 |
2005.07.14 |
申请号 |
WO2004JP19370 |
申请日期 |
2004.12.24 |
申请人 |
NIKON CORPORATION;FUKAZAWA, KAZUHIKO;OOMORI, TAKEO |
发明人 |
FUKAZAWA, KAZUHIKO;OOMORI, TAKEO |
分类号 |
G01N21/956;(IPC1-7):G01N21/956;H01L21/66 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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