| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a glass film, in which the glass film having the same composition and the same thickness is formed on both the top and under surfaces of a substrate, and an apparatus for manufacturing the same. SOLUTION: In the method for forming the glass film, an upper electrode 5 and a lower electrode 4 are arranged in such a manner that these electrodes face each other within a reaction vessel 11, applying a high voltage to the electrodes 4 and 5, the substrate 25 is arranged apart a gap 17 on the lower electrode 4, forming an open space 26 on the under surface of the substrate 25, and for forming the glass film on the top and under surfaces of the substrate 25, a halogen lamp heater 8 is positioned at the upper electrode 5 and the gas becoming a glass raw material is introduced into the reaction vessel 11 while heating the electrodes 4 and 5 to a prescribed temperature by the halogen lamp heater 8 to cause a pyrosis reaction under a plasma atmosphere, thereby forming the glass film on the top and under surfaces of the substrate 25. COPYRIGHT: (C)2005,JPO&NCIPI
|
