发明名称 PHOTOSENSITIVE BLACK COMPOSITION, BLACK MATRIX SUBSTRATE USING THE SAME AND COLOR FILTER
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive black composition which retains such a sensitivity as to form a cured film while reducing a carbon black content and has a wide development margin, and to provide a black matrix having a very high light blocking effect and a good shape. <P>SOLUTION: The photosensitive black composition contains a carbon black of &ge;pH 5 having &le;100 ml/100 g oil absorption of dibutyl phthalate, an ethylenically unsaturated compound and a photopolymerization initiator having a weight reduction rate of &ge;30% under the conditions of 230&deg;C and 30 min. A black matrix substrate with the black matrix formed from the photosensitive black composition is provided, and a color filter with filter segments of at least two colors other than black formed on the black matrix substrate is also provided. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005189561(A) 申请公布日期 2005.07.14
申请号 JP20030431738 申请日期 2003.12.26
申请人 TOYO INK MFG CO LTD 发明人 SASAKI HIROSHI;SAITO TAKESHI
分类号 G03F7/031;G02B5/20;G03F7/004 主分类号 G03F7/031
代理机构 代理人
主权项
地址