| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and equipment performing high quality liquid immersion exposure by preventing mixture of a bubble. SOLUTION: The exposing method comprises a step for introducing liquid between the surface of an article to be exposed and the final surface of a projection optical system, and a step for projecting a pattern formed on a mask onto the article to be exposed trough the projection optical system and the liquid. The introduction step comprises a step for filling the gap between the surface of the article to be exposed and the final surface of the projection optical system with the liquid, and the filling step is characterized in that capillary force of the liquid is varied as compared with that acting at the time of projection step. COPYRIGHT: (C)2005,JPO&NCIPI
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