| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection aligner capable of preventing variations in the amount of light exposure caused by contaminations, or the like adhering to a reticle; and to provide a projection exposure method. SOLUTION: Before exposure is started, a reticle supporting rack is filled with purge gas made of inert gas containing prescribed active gas, and fixed light beams are applied, thus recovering transmittance in the reticle deteriorated by the contaminations, and then obtaining real exposure time for executing exposure. As a result, variations in line width caused by a change in transmittance during the exposure of the reticle is suppressed, and the controllability of the line width can be improved. COPYRIGHT: (C)2005,JPO&NCIPI
|
