发明名称 MgO VAPOR-DEPOSITED MATERIAL AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To prevent occurrence of splash when depositing an MgO film, and to eliminate change in MgO film deposition rate with the lapse of time. SOLUTION: A MgO vapor-deposited material 11 has a porous structure with the porosity of 3-40%. The vapor-deposited material 11 is formed in a spherical shape of the diameter of 5-30 mm, or in a disk shape of the diameter of 3-20 mm and the height of 1-10 mm. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005187919(A) 申请公布日期 2005.07.14
申请号 JP20030433576 申请日期 2003.12.26
申请人 MITSUBISHI MATERIALS CORP 发明人 TOYOGUCHI GINJIRO
分类号 C04B38/06;C23C14/24;H01J9/02;H01J11/22;H01J11/34;H01J11/40;(IPC1-7):C23C14/24;H01J11/02 主分类号 C04B38/06
代理机构 代理人
主权项
地址