| 摘要 |
PROBLEM TO BE SOLVED: To provide a waste solution collecting device which can suitably collect and discard a waste solution after being processed regardless of an automatic or manual operating state of an apparatus for chemically processing an object such as a substrate using a plurality of sorts of processing solutions, a waste solution collection control method, and a developing device using the waste solution collecting device. SOLUTION: A developing device 100 comprises a processing chamber 10 for subjecting a substrate SUB to predetermined chemical treatment, a waste solution supplying section 20 for supplying predetermined processing solutions (developing solution and pure water) to at least the processing chamber 10 to blow it against the substrate SUB, a waste solution collector 30 for setting a transportation path for collection or discard of the waste solution after processed, and a device controller 40 for switchingly controlling the transportation path for the waste solution in the waste solution collector 30 so as to collect or discard the waste solution according to at least the types of the processing solutions supplied from the processing solution supplying section 20, the presence or absence of the supply, or the state of the waste solution. COPYRIGHT: (C)2005,JPO&NCIPI
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