| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum treatment device with a concise device structure capable of flexibly complying with various requests for vacuum treatment to both faces of a substrate. SOLUTION: This vacuum treatment device for giving the vacuum treatment to an object to be treated (W) comprises a main chamber (10) capable of maintaining an atmospheric pressure lower than that of atmospheric air, a vacuum treatment part (20) attached to the main chamber and giving the vacuum treatment to the object to be treated, a rotary conveyance mechanism (40) housed in the main chamber and conveying the object to be treated to a position subjected to the vacuum treatment by the vacuum treatment part, and a reversing mechanism (50) capable of reversing two sides of the object to be treated placed on the rotary conveyance mechanism. It is configured to reverse the object to be treated by the reversing mechanism before and after, or in the middle of the vacuum treatment so that the surface side and the back side of the object to be treated can be subjected to the vacuum treatment respectively. COPYRIGHT: (C)2005,JPO&NCIPI
|
