发明名称 |
DECONTAMINATION OF SUPERCRITICAL WAFER PROCESSING EQUIPMENT |
摘要 |
A method is disclosed for decontaminating a supercritical processing apparatus and/or wafers after a wafer (213) cleaning step. In accordance the embodiments of the invention, a supercritical cleaning step (501) utilizes a surfactant to clean a wafer (213) and uses a supercritical rinse solution in a post-cleaning step (505) to decontaminate the supercritical processing apparatus, the wafer or both from processing residues. In accordance with further embodiments of the invention, supercritical rinse solutions are used to cure processing surfaces of the supercritical processing apparatus after the supercritical processing apparatus is serviced or when replacement parts are installed. |
申请公布号 |
WO2004104697(A3) |
申请公布日期 |
2005.07.14 |
申请号 |
WO2004US15370 |
申请日期 |
2004.05.13 |
申请人 |
SUPERCRITICAL SYSTEMS, INC. |
发明人 |
SCHILLING, PAUL, E.;HILLMAN, JOSEPH |
分类号 |
B08B7/00 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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