| 摘要 |
A photosensitive resin composition for optical waveguide formation, comprising: (A) a di(meth)acrylate having the structure represented by the following general formula (1): <CHEM> (wherein R<1> is -(OCH2CH2)m-, -(OCH(CH3)CH2)m-, or -OCH2CH(OH)CH2-; X is -C(CH3)2-, -CH2-, -O-, or -SO2-; Y is a hydrogen atom or a halogen atom; m is an integer of 0 to 4); (B) a mono(meth)acrylate having the structure represented by the following general formula (2): <CHEM> (wherein R<2> is -(OCH2CH2)p-, -(OCH(CH3)CH2)p-, or -OCH2CH(OH)CH2-; Y is a hydrogen atom, a halogen atom, Ph-C(CH3)2-, Ph-, or an alkyl group having 1 to 20 carbon atoms; p is an integer of 0 to 4; Ph is a phenyl group); and (C) a photoradical polymerization initiator. The composition has excellent patterning ability, refractive index, heat resistance, and transmission characteristic.
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