发明名称 ELECTROMAGNETIC WAVE SHIELD MATERIAL AND PROCESS FOR PRODUCING THE SAME
摘要 The present invention is to provide an electromagnetic wave shielding material which comprises a transparent substrate and a fine line pattern formed thereon, wherein the fine line pattern comprises a metal plating film using a physically developed metal silver as a catalytic nucleus and a process for preparing an electromagnetic wave shielding material which comprises exposing a light-sensitive material having a physical development nuclei layer and a silver halide emulsion layer on a transparent substrate in this order, precipitating metal silver with an optional fine line pattern onto the physical development nuclei layer by physical development, then, removing a layer provided on the physical development nuclei layer, and subjecting to plating a metal with the use of the physically developed metal silver as a catalytic nucleus
申请公布号 EP1553212(A1) 申请公布日期 2005.07.13
申请号 EP20030741353 申请日期 2003.07.11
申请人 FUJIMORI KOGYO CO., LTD.;MITSUBISHI PAPER MILLS LIMITED 发明人 YOSHIDA, Taro;SUZUKI, Atsushi;TSUBAI, Yasuo;KOBAYASHI, Kazuhisa
分类号 C25D5/56;C23C18/16;C23C18/28;C23C18/30;C23C18/31;C25D7/00;H05K9/00 主分类号 C25D5/56
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