| 摘要 |
<p>A generally rectangular magnetron (40; 50; 60, 80; 90; 100; 112) placed at the back of a rectangular target (16) to intensify the plasma in a sputter reactor configured for sputtering target material onto a rectangular panel (14). The magnetron (40; 50; 60, 80; 90; 100; 112) has a size only somewhat less than that of the target (14) and is scanned in the two perpendicular directions of the target with a scan length of, for example, about 100mm for a 2m target. The scan may follow a double-Z pattern along two links parallel to a target side and the two connecting diagonals. The magnetron (40; 50; 60, 80; 90; 100; 112) includes a closed plasma loop formed in a convolute shape, for example, serpentine or rectangularized helix with an inner pole (64;92) of nearly constant width extending along a single path and having one magnetic polarity completely surrounded by an outer pole (66;96) having the opposed polarity. <IMAGE></p> |
