| 摘要 |
FIELD: sewing industry, in particular, method of designing patterns for manufacture of sewing articles. ^ SUBSTANCE: method involves taking figure's anthropometric data; additionally measuring distance from shoulder point to vertical planes tangential to rear and front angles of armpits and from rear to front angles of armpits to horizontal plane extending through shoulder point; plotting basis grid from three vertical lines: average-sagittal line, line passing through neck base point, and line spaced from average-sagittal line by distance making half the full stretch of chest; drawing horizontal lines of basis grid through neck base point, depth of arm-hole on strip and back, waist on strip and back, thighs on strip and back; plotting throat line with common point corresponding to neck base point; calculating angles of inclination of shoulder lines; plotting shoulder lines, arm-hole lines, side lines and lower part lines. ^ EFFECT: improved quality of patterns for sewing article strips and backs. ^ 3 dwg |
