| 摘要 |
PROBLEM TO BE SOLVED: To provide a barrel type susceptor wherein the uniformities of film thicknesses are improved which are obtained respectively from among wafers and from among batches, and even when producing high-quality products, the productivity of the wafers can be improved without decreasing the number of the stages whereon the wafers are stuck and without requiring the mounting substitutions of the wafer in the course of its epitaxial growth process or every its epitaxial growth process. SOLUTION: In the barrel type susceptor used for semiconductor epitaxial growths, each face plane 5 of a main body 2 having a nearly truncated pyramidal shape is partitioned into two or more sections in its longitudinal direction, and in the respective sections, there are provided wafer mounting recessed portions 6a, 6b, 6c for mounting therein wafers, and further, inclined anglesθa,θb,θc whose bottom surfaces 6a<SB>1</SB>, 6b<SB>1</SB>, 6c<SB>1</SB>of the recessed portions form with the vertical line of the susceptor are decreased gradually every section from the upper side of the susceptor to its lower side. COPYRIGHT: (C)2005,JPO&NCIPI
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