| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a coating type antireflection film in which a low refractive index layer having a low refractive index can be formed on transparent resin film in a short period of time without deteriorating the transparent resin film, and which can be consecutively produced and is excellent in abrasion resistance and chemical resistance. <P>SOLUTION: The antireflection film is constituted by layering a hard coat layer 2, a high refractive index layer 3 and the low refractive index layer 4 in this order on transparent base material film 1 or by layering a conductive high refractive index hard coat layer and the low refractive index layer in this order on the transparent base material film. The low refractive index layer 4 is hardened by irradiating a coating film containing hollow silica particulates, a multifunctional (meth)acrylic compound and a photopolymerization initiator with ultraviolet rays under an atmosphere where oxygen concentration is 0-10,000 ppm. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
