| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a coating type and light absorbing type antireflection film in which a low refractive index layer having a low refractive index can be formed on transparent resin film in a short period of time without deteriorating the transparent resin film, and which can be consecutively produced and is excellent in abrasion resistance and chemical resistance. <P>SOLUTION: The antireflection film is constituted by layering an easy adhesion layer 2, a hard coat layer 3, a transparent conductive layer 4, a light absorbing layer 5 and the low refractive index layer 6 in this order on transparent base material film 1 or by layering the hard coat layer, a conductive light absorbing layer and the low refractive index layer in this order on the transparent base material film. The low refractive index layer 6 is hardened by irradiating a coating film containing hollow silica particulates, a multifunctional (meth)acrylic compound and a photopolymerization initiator with ultraviolet rays under an atmosphere where oxygen concentration is 0-10,000 ppm. The light absorbing type antireflection film is set so that its minimum reflectance is ≤0.5%, its transmittance at 550 nm wavelength is ≥70% and its reflectance at 400 nm wavelength is ≤2%. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
