| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a device manufacturing method and a mask by which an improved contrast can be obtained on a substrate level in projection exposure. <P>SOLUTION: The mask has a quartz-made transparent substrate Q and an absorber layer AB where a pattern is formed of, for example, chromium or chromium oxide, wherein the thickness (t) of the absorber layer AB is larger than the wavelengthλof a projection beam PB and three to four times as large as the width (b) of the absorber layer. The thick absorber layer causes TE polarized light (sagittal or s-polarized light) in transmitted light to increase. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
