| 摘要 |
An optical unit of the invention includes an X-ray optical device, an airtight container housing the X-ray optical device in an airtight state, and valves or opening mechanisms fitted to an X-ray inlet and X-ray outlet of the airtight container. An X-ray exposure system of the invention includes an X-ray source generating X-rays, an illumination optical system irradiating X-rays from the X-ray source onto a mask, and an optical unit housing an X-ray optical device which constitutes a projection optical system projecting a pattern image formed on the mask onto a photosensitive substrate. With the optical unit and the X-ray exposure system, contamination on the surface of the optical device can be suppressed, thereby suppressing deterioration in reflectance of the optical device, and that in throughput of the exposure system.
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