发明名称 Substrate proximity processing structures and methods for using and making the same
摘要 An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a substrate surface of the substrate. The housing further includes a process configuration receiving region that is surrounded by the housing surface. The apparatus also includes a process configuration insert which has an insert surface where the process configuration insert is defined to fit within the process configuration receiving region of the housing such that the insert surface and the housing surface define a proximity face that can be placed proximate to the substrate surface of the substrate.
申请公布号 US2005148197(A1) 申请公布日期 2005.07.07
申请号 US20040817355 申请日期 2004.04.01
申请人 LAM RESEARCH CORP. 发明人 WOODS CARL;SMITH MICHAEL G.;PARKS JOHN
分类号 B05D1/00;B08B3/00;B08B3/02;B08B3/04;C23C18/16;C25D5/08;C25D5/22;C25D7/12;C25D17/00;C25D21/00;H01L21/00;H01L21/02;H01L21/304;H01L21/306;(IPC1-7):H01L23/34;H01L21/302;H01L21/461 主分类号 B05D1/00
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