发明名称 METHOD OF DETECTING OXYGEN LEAKAGE
摘要 A method of detecting oxygen leakage. Firstly, a detection wafer having a substrate and a metallic film with a first color positioned on the substrate is provided. Then, the detection wafer is loaded into a reaction tube from a loading chamber, and subsequently, the detection wafer is unloaded from the reaction tube. Finally, a surface of the detection wafer is observed to obtain a second color of the metallic film, wherein if oxygen leaks into the loading chamber, the second color is different from the first color.
申请公布号 US2005148079(A1) 申请公布日期 2005.07.07
申请号 US20040710235 申请日期 2004.06.28
申请人 TAI CHUN-LIANG;YANG YI-CHANG 发明人 TAI CHUN-LIANG;YANG YI-CHANG
分类号 C23C16/44;G01N21/78;G01N31/00;G01N31/22;H01L21/66;(IPC1-7):G01N31/00 主分类号 C23C16/44
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